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SPUTTERING TARGETS
Sputtering Target
Alloy Sputtering Target
An alloy sputtering target is a piece of metal that is made up of a mixture of two or more elements. It is used in a process called sputter deposition, which is a type of physical vapor deposition (PVD). In this process, a high-energy beam of ions is used to sputter, or knock atoms off, the surface of the target material. The sputtered atoms are then deposited onto a substrate to form a thin film.
Alloy sputtering targets are used in a variety of applications, including the production of electronic devices, decorative coatings, and optical films. They are also used in the production of solar cells and other renewable energy technologies.
Pure Metal Target
A pure metal target is a piece of metal that is composed of a single element or compound, rather than being an alloy made up of multiple elements. Pure metal targets are used in a variety of applications, including scientific research, industrial processes, and manufacturing. They may be made of any metal, including common elements like copper, aluminum, and gold, as well as more exotic materials such as platinum and iridium.
Pure metal targets are often used in scientific research because they allow researchers to study the properties and behavior of a particular metal in isolation, without the complications that can arise from the presence of other elements. They are also used in industrial processes, such as in the production of high-purity metals for use in electronic devices or other applications where purity is important.
Pure metal targets may be produced through a variety of methods, including melting, casting, and electrodeposition. The specific method used will depend on the nature of the metal and the desired end use of the target.
Compound Sputtering Target
A compound sputtering target is a piece of material that is made up of two or more elements combined in a specific chemical formula. It is used in a process called sputter deposition, which is a type of physical vapor deposition (PVD). In this process, a high-energy beam of ions is used to sputter, or knock atoms off, the surface of the target material. The sputtered atoms are then deposited onto a substrate to form a thin film.
Compound sputtering targets are used in a variety of applications, including the production of electronic devices, decorative coatings, and optical films. They are also used in the production of solar cells and other renewable energy technologies.